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Dose latitude dependency on resist contrast in e-beam mask lithography

Author(s):
Cha,B.-C. ( Samsung Electronics Co.,Ltd. )
Moon,S.-Y.
Ki,W.-T.
Yang,S.-H.
Choi,S.-W.
Han,W.-S.
Yoon,H.-S.
Sohn,J.-M.
3 more
Publication title:
Photomask and Next-Generation Lithography Mask Technology VII
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
4066
Pub. date:
2000
Page(from):
200
Page(to):
209
Pub. info.:
Bellingham, Wash.: SPIE - The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819437020 [0819437026]
Language:
English
Call no.:
P63600/4066
Type:
Conference Proceedings

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