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Next-generation lithography mask development at the NGL-MCOC

Author(s):
Lercel,M.J. ( Photronics Inc.(USA)and IBM Microelectronics Div. )
Racette,K.C.
Magg,C.
Lawliss,M.
Collins,K.W.
Barrett,M.
Trybendis,M.J.
Bouchard,L.
3 more
Publication title:
Photomask and Next-Generation Lithography Mask Technology VII
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
4066
Pub. date:
2000
Page(from):
105
Page(to):
115
Pub. info.:
Bellingham, Wash.: SPIE - The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819437020 [0819437026]
Language:
English
Call no.:
P63600/4066
Type:
Conference Proceedings

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