Impact of MEF on 0.15-ヲフm KrF lithography
- Author(s):
- Iwasaki,H. ( NEC Corp. )
- Tanabe,H.
- Publication title:
- Photomask and Next-Generation Lithography Mask Technology VII
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 4066
- Pub. Year:
- 2000
- Page(from):
- 24
- Page(to):
- 31
- Pub. info.:
- Bellingham, Wash.: SPIE - The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819437020 [0819437026]
- Language:
- English
- Call no.:
- P63600/4066
- Type:
- Conference Proceedings
Similar Items:
SPIE - The International Society for Optical Engineering |
7
Conference Proceedings
High-transmittance rim-type attenuated phase-shift masks for sub-0.2-ヲフm hole patterns
SPIE-The International Society for Optical Engineering |
2
Conference Proceedings
Optimizing of thin-film interference effects in KrF lithography for 0.15-ヲフm design rules
SPIE - The International Society for Optical Engineering |
SPIE - The International Society for Optical Engineering |
3
Conference Proceedings
Illumination condition and mask bias for 0.15-ヲフm pattern with KrF and ArF lithography
SPIE - The International Society for Optical Engineering |
9
Conference Proceedings
Comparison study for sub-0.13-ヲフm lithography between ArF and KrF lithography
SPIE - The International Society for Optical Engineering |
4
Conference Proceedings
Fabrication of 0.15 ヲフm SOIp-MOSFETs using Synchrotron Radiation X-ray Lithography,
SPIE-The International Society for Optical Engineering |
10
Conference Proceedings
Process-induced defects in sub-0.15-ヲフm device patterning using 193-nm lithography
SPIE - The International Society for Optical Engineering |
5
Conference Proceedings
Optical proximity correction of alternating phase-shift masks for 0.18-ヲフm KrF lithography
SPIE-The International Society for Optical Engineering |
11
Conference Proceedings
Aberration effects in the region of 0.18-ヲフm lithography with KrF excimer stepper
SPIE-The International Society for Optical Engineering |
6
Conference Proceedings
Impact of optical absorption on process control for sub-0.15-ヲフm device patterning using 193-nm lithography
SPIE - The International Society for Optical Engineering |
12
Conference Proceedings
ArF step-and-scan exposure system for 0.15-ヲフm and 0.13-ヲフm technology nodes
SPIE - The International Society for Optical Engineering |