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Lithography and CD performance of advanced MEBES mask pattern generators

Author(s):
Chabala,J.M. ( Etec Systems,Inc. )
Cole,D.M.
Pearce-Percy,H.T.
Phillips,W.
Lu,M.
Weaver,S.
Alexander,D.
Coleman,T.
Sauer,C.A.
Abboud,F.E.
5 more
Publication title:
16th European Conference on Mask Technology for Integrated Circuits and Microcomponents : 15-16 November 1999, Munich, Germany
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
3996
Pub. Year:
2000
Page(from):
200
Page(to):
215
Pub. info.:
Bellingham, Wash.: SPIE - The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819436146 [0819436143]
Language:
English
Call no.:
P63600/3996
Type:
Conference Proceedings

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