Blank Cover Image

Improvements to mask inspectability by use of pattern proximity correction

Author(s):
Rosenbusch,A. ( Sigma-C Inc. )
Bailey,V.
Eran,Y.
Falah,R.
Holmes,N.J.
Hourd,A.C.
McArthur,A.
Staud,W.
3 more
Publication title:
16th European Conference on Mask Technology for Integrated Circuits and Microcomponents : 15-16 November 1999, Munich, Germany
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
3996
Pub. Year:
2000
Page(from):
190
Page(to):
199
Pub. info.:
Bellingham, Wash.: SPIE - The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819436146 [0819436143]
Language:
English
Call no.:
P63600/3996
Type:
Conference Proceedings

Similar Items:

1 Conference Proceedings Impact of pattern proximity correction on die-to-database mask inspection

Rosenbusch,A., Bailey,V., Eran,Y., Falah,F., Hamar,S., Holmes,H.J., Hound,A.C., Kirsch,H., McArthur,A.

SPIE - The International Society for Optical Engineering
7 Conference Proceedings Incorporation of laser proximity correction into mask production

Rosenbusch,A., Unruh,J., Kirsch,H., Chan,D.

SPIE - The International Society for Optical Engineering
2 Conference Proceedings Hierarchical e-beam proximity correction in mask making

Hofmann,U., Kalus,C.K., Rosenbusch,A., Jonckheere,R., Hourd,A.C.

SPIE-The International Society for Optical Engineering
8 Conference Proceedings New approach to optical proximity correction

Rosenbusch,A., Juffermans,A.H., Kirsch,H., Lalanne,F.P., Maurer,W., Romeo,C., Ronse,K., Schiavone,P., Simecek,M., …

SPIE - The International Society for Optical Engineering
3 Conference Proceedings Halftone PSM inspection sensitivity of OPC line/space pattern for 150-nm generation

Wu,C.H., Cheng,J., Wang,D., Wu,C., Eran,Y., Falah,F., Staud,W.

SPIE - The International Society for Optical Engineering
9 Conference Proceedings Techniques to inspect SCALPEL masks

Taylor,D., Howard,W.B., Kasica,R.J., Farrow,R.C., Novembre,A.E., Caminos,C., Knurek,C.S.

SPIE - The International Society for Optical Engineering
4 Conference Proceedings CD uniformity control using aerial image-based mask inspection

Hemar, S., Rosenbusch, A., Falah, R.

SPIE-The International Society for Optical Engineering
10 Conference Proceedings Defect dispositioning using mask printability on attenuated phase-shift production photomasks

Novak,J.W., Eynon,B.G., Poortinga,E., Rosenbusch,A., Eran,Y.

SPIE-The International Society for Optical Engineering
5 Conference Proceedings Application of a new approach to optical proximity correction

Rosenbusch,A., Hourd,A.C., Juffermans,C.A., Kirsch,H., Lalanne,F.P., Maurer,W., Romeo,C., Ronse,K., Schiavone,P., …

SPIE - The International Society for Optical Engineering
11 Conference Proceedings Hierarchical proximity correction using CAPROX

Hofmann,U., Kalus,C.K., Rosenbusch,A., Endo,H., Kimura,Y., Endo,A.

SPIE-The International Society for Optical Engineering
6 Conference Proceedings Inspection of aggressive OPC using aerial image-based mask inspection

Hsu, L.T.H., Hung, J.C., Hsieh, H.-C., Rosenbusch, A., Falah, R., Blumberg, Y.

SPIE-The International Society for Optical Engineering
12 Conference Proceedings Assessment of corner-rounding improvement by automatic software correction on laser pattern generator manufactured photomasks

Ziegler,W., Rosenbusch,A.

SPIE - The International Society for Optical Engineering
1
 
2
 
3
 
4
 
5
 
6
 
7
 
8
 
9
 
10
 
11
 
12