Reticle imaging and metrology using a CD-SEM at IMEC
- Author(s):
James,A. ( KLA-Tencor ) Felten,F. Polli,M. England,J.G. Marschner,T. Vandenberghe,G. - Publication title:
- 16th European Conference on Mask Technology for Integrated Circuits and Microcomponents : 15-16 November 1999, Munich, Germany
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 3996
- Pub. Year:
- 2000
- Page(from):
- 128
- Page(to):
- 133
- Pub. info.:
- Bellingham, Wash.: SPIE - The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819436146 [0819436143]
- Language:
- English
- Call no.:
- P63600/3996
- Type:
- Conference Proceedings
Similar Items:
1
Conference Proceedings
Determination of best focus and exposure dose using CD-SEM sidewall imaging
SPIE-The International Society for Optical Engineering |
7
Conference Proceedings
Implementation of 248-nm based CD metrology for advanced reticle production
SPIE-The International Society for Optical Engineering |
2
Conference Proceedings
CD control comparison for sub-0.18-ヲフm patterning using 248-nm lithography and strong resolution enhancement techniques
SPIE - The International Society for Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |
9
Conference Proceedings
Initial characterization results of a low-voltage CD SEM for reticle metrology
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE - The International Society of Optical Engineering |
5
Conference Proceedings
Matching of different CD-metrology tools for global CD signature on photomasks
SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |
6
Conference Proceedings
Reliable subnanometer repeatability for CD metrology in a reticle production environment
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |