Blank Cover Image

Cluster tool for photomask inspection and qualification at 150-nm design rules and beyond

Author(s):
Publication title:
16th European Conference on Mask Technology for Integrated Circuits and Microcomponents : 15-16 November 1999, Munich, Germany
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
3996
Pub. Year:
2000
Page(from):
120
Page(to):
122
Pub. info.:
Bellingham, Wash.: SPIE - The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819436146 [0819436143]
Language:
English
Call no.:
P63600/3996
Type:
Conference Proceedings

Similar Items:

1 Conference Proceedings Cluster tool solution for fabrication and qualification of advanced photomasks

Schatz,T., Hartmann,H., Peter,K., Lalanne,F.P., Maurin,O., Baracchi,E., Miramond,C., Bruck,H.-J., Scheuring,G., …

SPIE - The International Society for Optical Engineering
7 Conference Proceedings Advanced optical imaging platform for CD metrology and defect review on 130-nm to 100-nm node reticles: and overview of preliminary results

Hourd, A.C., Grimshaw, A., Scheuring, G., Gittinger, C., Brueck, H.-J., Chen, S.-B., Chen, P.W., Hartmann, H., …

SPIE-The International Society for Optical Engineering
2 Conference Proceedings Quality assessment of advanced photomasks using the Q-CAP cluster tool

Peter,K., Schatz,T., Ordynskyy,V., Liebe,R., Verbeek,M., Galan,G., Baracchi,E., Miramond,C., Bruck,H.-J., Scheuring,G., …

SPIE-The International Society for Optical Engineering
8 Conference Proceedings Achieving 65-nm design rule dry etch performance: a study of CD bias, uniformity, and linearity on binary chrome photomasks

Plumhoff, J., Constantine, C., Reelfs, B.H.

SPIE - The International Society of Optical Engineering
3 Conference Proceedings Definition of new quality criteria and assessment means for masks at 150-nm design rules and beyond

Baracchi,E., Bruck,H.-J., Engel,T., Eran,Y., Lalanne,F.P., Maurin,O., Ordynskyy,V., Schatz,T., Sommer,K.

SPIE - The International Society for Optical Engineering
9 Conference Proceedings Actinic aerial image measurement for qualification of defect on 157-nm photomask

Yasui, T., Higashikawa, I., Kuschnerus, P., Degel, W., Boehm, K., Zibold, A.M., Kobiyama, Y., Urbach, J.-P., Schilz, …

SPIE - The International Society of Optical Engineering
4 Conference Proceedings Implementation of 248-nm based CD metrology for advanced reticle production

Hourd, A.C., Grimshaw, A., Scheuring, G., Gittinger, C., Doebereiner, S., Hillmann, F., Brueck, H.-J., Hartmann, H., …

SPIE-The International Society for Optical Engineering
10 Conference Proceedings Component-based assiatants for MEMS design tools

Hahn,K., Bruck,R., Schneider,C., Schumer,C., Popp,J.

SPIE-The International Society for Optical Engineering
5 Conference Proceedings High-performance reticle inspection tool for the 65-nm node and beyond

T. -Y. Kang, C. -H. Chen, C. -H. Ho, L. Hsu, Y. -C. Ku, K. Nakamura, H. Moribe, T. Bashomatsu, K. Matsumura, K. Hatta, …

SPIE - The International Society of Optical Engineering
11 Conference Proceedings High-resolution reticle inspection technique providing a complete reticle qualification solution in advanced 90-nm node wafer fabs

Liu, L., Liao, C.-H., Dai, Y.-M., Lin, J.-C., Bhattacharyya, K., Huang, Y.-T., Son, K., Wang, D.

SPIE - The International Society of Optical Engineering
6 Conference Proceedings Mask rule check for inspection of leading-edge photomask [5992-150]

Sakata, W., Yamasaki, K., Narukawa, S., Hayashi, N.

SPIE - The International Society of Optical Engineering
12 Conference Proceedings Reliable subnanometer repeatability for CD metrology in a reticle production environment

Hourd, A.C., Grimshaw, A., Scheuring, G., Gittinger, C., Doebereiner, S., Hillmann, F., Brueck, H.-J., Chen, S.-B., …

SPIE-The International Society for Optical Engineering
1
 
2
 
3
 
4
 
5
 
6
 
7
 
8
 
9
 
10
 
11
 
12