Cluster tool for photomask inspection and qualification at 150-nm design rules and beyond
- Author(s):
- Peter,K. ( aiss GmbH )
- Ordynskyy,V.
- Dolainsky,C.
- Hartmann,H.
- Bruck,H.-J.
- Publication title:
- 16th European Conference on Mask Technology for Integrated Circuits and Microcomponents : 15-16 November 1999, Munich, Germany
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 3996
- Pub. Year:
- 2000
- Page(from):
- 120
- Page(to):
- 122
- Pub. info.:
- Bellingham, Wash.: SPIE - The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819436146 [0819436143]
- Language:
- English
- Call no.:
- P63600/3996
- Type:
- Conference Proceedings
Similar Items:
1
Conference Proceedings
Cluster tool solution for fabrication and qualification of advanced photomasks
SPIE - The International Society for Optical Engineering |
7
Conference Proceedings
Advanced optical imaging platform for CD metrology and defect review on 130-nm to 100-nm node reticles: and overview of preliminary results
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
8
Conference Proceedings
Achieving 65-nm design rule dry etch performance: a study of CD bias, uniformity, and linearity on binary chrome photomasks
SPIE - The International Society of Optical Engineering |
3
Conference Proceedings
Definition of new quality criteria and assessment means for masks at 150-nm design rules and beyond
SPIE - The International Society for Optical Engineering |
9
Conference Proceedings
Actinic aerial image measurement for qualification of defect on 157-nm photomask
SPIE - The International Society of Optical Engineering |
4
Conference Proceedings
Implementation of 248-nm based CD metrology for advanced reticle production
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE - The International Society of Optical Engineering |
11
Conference Proceedings
High-resolution reticle inspection technique providing a complete reticle qualification solution in advanced 90-nm node wafer fabs
SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |
12
Conference Proceedings
Reliable subnanometer repeatability for CD metrology in a reticle production environment
SPIE-The International Society for Optical Engineering |