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Development of embedded attenuated phase-shifting mask(EAPSM)blanks for ArF lithography

Author(s):
Mitsui,H. ( HOYA Corp. )
Nozawa,O.
Ohtsuka,H.
Takeuchi,M.
Kobayashi,H.
Ushida,M.
1 more
Publication title:
16th European Conference on Mask Technology for Integrated Circuits and Microcomponents : 15-16 November 1999, Munich, Germany
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
3996
Pub. Year:
2000
Page(from):
108
Page(to):
113
Pub. info.:
Bellingham, Wash.: SPIE - The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819436146 [0819436143]
Language:
English
Call no.:
P63600/3996
Type:
Conference Proceedings

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