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Layout postprocessing in ion projection lithography(IPL)

Author(s):
Hartmann,H. ( aiss GmbH )
Petraschenko,A.
Schunk,S.
Steinmetz,R.
Haugeneder,E.
Loschner,H.
1 more
Publication title:
16th European Conference on Mask Technology for Integrated Circuits and Microcomponents : 15-16 November 1999, Munich, Germany
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
3996
Pub. Year:
2000
Page(from):
105
Page(to):
107
Pub. info.:
Bellingham, Wash.: SPIE - The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819436146 [0819436143]
Language:
English
Call no.:
P63600/3996
Type:
Conference Proceedings

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