Defect printability and repair of alternating phase-shift masks

Defect printability and repair of alternating phase-shift masks

Author(s):

Friedrich,C. ( Infineon Technologies AG )

Publication title:

16th European Conference on Mask Technology for Integrated Circuits and Microcomponents : 15-16 November 1999, Munich, Germany

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

3996

Pub. Year:

2000

Page(from):

8

Page(to):

19

Pub. info.:

Bellingham, Wash.: SPIE - The International Society for Optical Engineering

ISSN:

0277786X

ISBN:

9780819436146 [0819436143]

Language:

English

Call no.:

P63600/3996

Type:

Conference Proceedings

Details

TDL ID:	ZA00017587
Series ID:	PA00000029
Conf. info. (Name):	European Mask and Lithography Conference : European Conference on Mask Technology for Integrated Circuits and Microcomponents
Conf. info. (Number):	1999 : 16th
Conf. info. (Venue):	Munich, Germany
Conf. info. (Date):	1999.11.15-1999.11.16

Similar Items:

1 Conference Proceedings Transmission and phase balancing of alternating phase-shifting masks(5X):theoretical and experimental results Griesinger,U.A., Pforr,R., Knobloch,J., Friedrich,C. SPIE - The International Society for Optical Engineering	7 Conference Proceedings Application of 3D EMF simulation for development and optimization of alternating phase-shifting masks Semmler,A., Mader,L., Elsner,A., Koehle,R., Griesinger,U.A., Noelscher,C. SPIE-The International Society for Optical Engineering
2 Conference Proceedings "Alternating phase-shifting mask application: effect of width and geometry of shifters, 3D EMF simulation and experimental verification" Semmler,A., Elsner,A., Koehle,R., Mader,L., Pforr,R., Noelscher,C., Friedrich,C.M., Knobloch,J., Griesinger,U.A. SPIE-The International Society for Optical Engineering	8 Conference Proceedings Phase defect inspection of 130-nm node phase-shift masks using a simultaneous transmitted and reflected light pattern inspection algorithm Zurbrick,L.S., Emery,D., Rudzinski,M.W., Wihl,M.J., Prudhomme,M., Crell,C., Griesinger,U.A., Vorwerk,M., Hennig,M. SPIE-The International Society for Optical Engineering
3 Conference Proceedings Evaluating the potential of alternating phase-shift masks using lithography simulation Friedrich,C., Ergenzinger,K., Gans,F., Crassmann,A., Griesinger,U.A., Knobloch,J., Mader,L., Maurer,W., Pforr,R. SPIE - The International Society for Optical Engineering	9 Conference Proceedings Defect dispositiong using mask printability analysis on alternating phase-shifting masks Chang, C.-H., Hsieh, C.-H., Tzu, S.-D., Dai, C.-M., Lin, B. J., Pang, L., Qian, Q.-D., Chen, J.-H., Huang, J. H. SPIE-The International Society for Optical Engineering
4 Conference Proceedings Balancing of alternating phase-shifting masks for practical application: modeling and experimental verification Griesinger,U.A., Mader,L., Semmler,A., Dettmann,W., Noelscher,C., Pforr,R. SPIE-The International Society for Optical Engineering	10 Conference Proceedings Defect printability analysis on alternating phase-shifting masks Pang, L., Qian, Q.-D., Chan, K.K., Morikawa, Y., Nishiguchi, M., Hayashi, N. SPIE-The International Society for Optical Engineering
5 Conference Proceedings Optimizing edge topography of alternating phase-shift masks using rigorous mask modeling Friedrich,C., Mader,L., Erdmann,A., List,S., Gordon,R.L., Kalus,C.K., Griesinger,U.A., Pforr,R., Mathuni,J., Ruhl,G.G., … SPIE - The International Society for Optical Engineering	11 Conference Proceedings Defect printability analysis on alternating phase-shifting masks for 193-nm lithography Morikawa, Y., Totsu, Y., Nishiguchi, M., Hoga, M., Hayashi, N., Pang, L., Luk-Pat, G.T. SPIE-The International Society for Optical Engineering
6 Conference Proceedings Alternating phase-shifting masks: phase determination and impact of quartz defects- theoretical and experimental results Griesinger, U.A., Dettmann, W., Hennig, M., Heumann, J.P., Koehle, R., Ludwig, R., Verbeek, M., Zarrabian, M. SPIE-The International Society for Optical Engineering	12 Conference Proceedings Defect printability and inspectability of Cr-less phase-shift masks for the 70nm node J. Heumann, J. Schramm, A. Birnstein, K.T. Park, T. Witte, N. Morgana, M. Hennig, R. Pforr, J. Thiele, N. Schmidt, C. … SPIE - The International Society of Optical Engineering

1

2

3

4

5

6

7

8

9

10

11

12