Boron Diffusion in Si and Si1-xGex

Boron Diffusion in Si and Si1-xGex

Author(s):

Publication title:

Strained layer epitaxy - materials processing and device applications : symposium held April 17-19, 1995, San Francisco, California, U.S.A.

Title of ser.:

Materials Research Society symposium proceedings

Ser. no.:

379

Pub. Year:

1995

Page(from):

373

Pub. info.:

Pittsburgh, PA: MRS - Materials Research Society

ISSN:

02729172

ISBN:

9781558992825 [1558992820]

Language:

English

Call no.:

M23500/379

Type:

Conference Proceedings

Details

TDL ID:	ZA00017534
Series ID:	PA00000011
Conf. info. (Name):	Symposium on strained layer epitaxy-materials, processing, and device applications
Conf. info. (Number):	1995
Conf. info. (Venue):	San Francisco, CA, USA
Conf. info. (Date):	1995.04.17-1995.04.19

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