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Temperature Dependence of Wafer Backside Deposition in Single Wafer CVD Reactor

Author(s):
Publication title:
Properties and processing of vapor-deposited coatings : symposium held November 30-December 2, 1998, Boston, Massachusetts, U.S.A.
Title of ser.:
Materials Research Society symposium proceedings
Ser. no.:
555
Pub. Year:
1999
Page(from):
209
Pub. info.:
Warrendale, PA.: MRS - Materials Research Society
ISSN:
02729172
ISBN:
9781558994614 [1558994610]
Language:
English
Call no.:
M23500/555
Type:
Conference Proceedings

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