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Overview of Process Integration Issues for Low-K Dielectrics

Author(s):
Havemann, R. H.
Jain, M. K.
List, R. S.
Ralston, A. R.
Shih, W-Y.
Jin, C.
Chang, M. C.
Zielinski, E. M.
Dixit, G. A.
Singh, A.
Russell, S. W.
Gaynor, J. F.
McKerrow, A. J.
Lee, W. W.
9 more
Publication title:
Low-dielectric constant materials IV : symposium held April 14-16, 1998, San Francisco, California, U.S.A.
Title of ser.:
Materials Research Society symposium proceedings
Ser. no.:
511
Pub. Year:
1998
Page(from):
3
Pub. info.:
Warrendale, Pa.: MRS - Materials Research Society
ISSN:
02729172
ISBN:
9781558994171 [1558994173]
Language:
English
Call no.:
M23500/511
Type:
Conference Proceedings

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