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Application of alternating PSM to sub-quarter-micrometer technology using i-line lithography

Author(s):
Publication title:
15th Annual BACUS Symposium on Photomask Technology and Management
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
2621
Pub. Year:
1995
Page(from):
432
Page(to):
444
Pub. info.:
Bellingham, Wash.: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819419859 [0819419850]
Language:
English
Call no.:
P63600/2621
Type:
Conference Proceedings

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