Blank Cover Image

Shifter slope variation effect of embedded halftone phase-shift masks

Author(s):
Publication title:
15th Annual BACUS Symposium on Photomask Technology and Management
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
2621
Pub. Year:
1995
Page(from):
344
Page(to):
352
Pub. info.:
Bellingham, Wash.: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819419859 [0819419850]
Language:
English
Call no.:
P63600/2621
Type:
Conference Proceedings

Similar Items:

1 Conference Proceedings Fabrication of dense contact patterns using halftone phase-shifting mask with off-axis illumination

Kim,H.-J., Kye,J.-W., Lee,D.-Y., Woo,S.-G., Kang,H.-Y., Koh,Y.-B.

SPIE-The International Society for Optical Engineering
7 Conference Proceedings Stability of CrFx films for phase-shifting mask

Kim,E., Hong,S., Jiang,Z.-T., Lim,S., Woo,S.-G., Koh,Y.-B., No,K.

SPIE-The International Society for Optical Engineering
2 Conference Proceedings Application of alternating phase-shifting masks to sub-quarter-micrometer contact holes

Lim,S.-C., Kye,J.-W., Woo,S.-G., Kim,S.-G., Kang,H.-Y., Han,W.-S., Koh,Y.-B.

SPIE-The International Society for Optical Engineering
8 Conference Proceedings Side-lobe suppression in halftone PSM with optical proximity correction

Shin,I.-G., Lim,S.-C., Woo,S.-G., Han,W.-S., Koh,Y.-B.

SPIE-The International Society for Optical Engineering
3 Conference Proceedings Application of alternating phase shift mask to device fabrication

S.-G. Kim, S.-G. Woo, W.-S. Han, Y.-B. Koh, M.-Y. Lee

Society of Photo-optical Instrumentation Engineers
9 Conference Proceedings Investigation on application of chromium-based materials to attenuated phase-shift masks for DUV exposure

Hong,S., Kim,E., Jiang,Z.-T., Bae,B.-S., No,K., Shin,W., Lim,S.-C., Woo,S.-G., Koh,Y.-B.

SPIE-The International Society for Optical Engineering
4 Conference Proceedings Dependency of side-lobe effect of half-tone phase-shift mask on substrate material and topology and its solutions

S.-C. Lim, S.-G. Woo, W.-S. Han, Y.-B. Koh, M.-Y. Lee

Society of Photo-optical Instrumentation Engineers
10 Conference Proceedings Application of alternating phase-shifting masks to 200-nm contact holes

Lim,S.-C., Woo,S.-G., Park,C.-G., Koh,Y.-B.

SPIE-The International Society for Optical Engineering
5 Conference Proceedings Defect inspection and printability of deep-UV halftone phase-shifting mask

Kim,H.-J., Hong,J.-S., Kye,J.-W., Cha,D.-H., Kang,H.-Y., Moon,J.-T.

SPIE-The International Society for Optical Engineering
11 Conference Proceedings Effect of mask reduction ratio in alternating phase-shift masks

Shin,I.-G., Lee,S.-W., Kim,Y.-H., Choi,S.-W., Han,W.-S., Sohn,J.-M., Lim,T.-K.

SPIE-The International Society for Optical Engineering
6 Conference Proceedings Fidelity comparison of island patterns with different types of illuminations and phase shift masks

S.-Y. Moon, W.-S. Han, S.-G. Woo, C.-J. Sohn, C.-H. Kim

Society of Photo-optical Instrumentation Engineers
12 Conference Proceedings Evaluation of phase-edge phase-shifting mask for sub-0.18-ｦﾌm gate patterns in logic devices

Cha,D.-H., Kye,J.-W., Seong,N.-G., Kang,H.-Y., Cho,H.-K., Moon,J.-T.

SPIE-The International Society for Optical Engineering
1
 
2
 
3
 
4
 
5
 
6
 
7
 
8
 
9
 
10
 
11
 
12