Plasma Deposition,Properties and Structure of Amorphous Hydrogenated Carbon Films

Plasma Deposition,Properties and Structure of Amorphous Hydrogenated Carbon Films

Author(s):

Publication title:

Properties and characterization of amorphous carbon films

Title of ser.:

Materials science forum

Ser. no.:

52-53

Pub. Year:

1990

Page(from):

41

Page(to):

70

Pub. info.:

Zurich, Switzerland: Trans Tech Publications

ISSN:

02555476

ISBN:

9780878496044 [0878496041]

Language:

English

Call no.:

M23650

Type:

Conference Proceedings

Details

TDL ID:	ZA00017428
Series ID:	PA00000012

Similar Items:

1 Conference Proceedings Amorphous Hydrogenated Carbon Films and Relacted Materials: Plasma Deposition and Film Growth Koidl P., Wild C., Locher R., Sah E. R. Plenum Press	7 Conference Proceedings Hard Amorphous Hydrogenated Carbon Films Deposited from an Expanding Thermal Plasma Gielen, J. W. A. M., Sanden, M. C. M. van de, Kessels, W. M. M., Schram, D. C. MRS - Materials Research Society
2 Conference Proceedings CHARACTERIZATION OF HYDROCARBON PLASMA USED FOR a-C:H DEPOSITION Wagner, J., Wild, Ch., Bubenzer, A., Koidl, P. Materials Research Society	8 Conference Proceedings PHOTO-OXIDATION OF HYDROGENATED AMORPHOUS SILICON-CARBON ALLOYS John, P., Odeh, I.M., Qayyum, A., Wilson, J.I.B. Materials Research Society
3 Conference Proceedings EFFECTS OF Si INCORPORATION AND ELECTRICAL ACTIVATION ON INTERSUBBAND OPTICAL ABSORPTION I MBE-GROWN GaAs/A1GaAs MULTIPLE QUANTUM WELL STRUCTURES Ralston, J.D., Ennen, H., Maier, M., Ramsteiner, M., Dischler, B., Koidl, P., Hiesinger, P. Materials Research Society	9 Conference Proceedings PROPERTIES OF HYDROGENATED TETRAHEDRAL AMORPHOUS CARBON Weiler, M., Sattel, S., Robertson, J., Jung, K., Ehrhardt, H. Electrochemical Society
4 Conference Proceedings LOW TEMPERATURE INFRARED MEASUREMENTS AND PHOTO-INDUCED PRESISTENT CHANGES OF INTERSUBBAND TRANSITIONS IN GaAs/AlGaAs MULTIPLE QUANTUM WELLS Dischler, B., Ralston, J.D., Koidl, P., Hiesinger, P., Ramsteiner, M., Maier. M. Materials Research Society	10 Conference Proceedings INFLUENCE OF PLASMA EXCITATION FREQUENCY ON DEPOSITION RATE AND ON FILM PROPERTIES FOR HYDROGENATED AMORPHOUS SILICON Curtins, H., Wyrach, N., Favre, M., Prasad, K., Brechet, M., Shah, A. V. Materials Research Society
5 Conference Proceedings Plasma-Deposited Amorphous Hydrogenated Carbon Films and Their Tribological Properties Miyoshi,K., Pouch,J.J., Alterovitz,S.A. Trans Tech Publications	11 Conference Proceedings Photovoltaic Intersubband Photodetectors Using GaAs Quantum Wells Confined by AlAs Tunnel Barriers Schneider H., Kheng K., Fuchs F., Ralston D. J., Dischler B., Koidl P. Plenum Press
6 Conference Proceedings The Effects of Deposition Pressure on the Optical and Structural Properties of d.c. PECVD Hydrogenated Amorphous Carbon Films Awang, R., Tong, G.B., Gani, S.M.A., Ritikos, R., Rahman, S.A. Trans Tech Publications	12 Conference Proceedings PIEZOELECTRIC EFFECT ON PLASMA CHEMICAL VAPOR DEPOSITION OF HYDROGENATED AMORPHOUS SILICON FILMS Kawasaki, M., Sumiya, M., Koinuma, H. Materials Research Society

1

2

3

4

5

6

7

8

9

10

11

12