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Modeling approaches for Rapid Thermal Chemical Vapor Deposition: combining transport phenomena with chemical kinetics

Author(s):
Publication title:
Advances in rapid thermal and integrated processing
Title of ser.:
NATO ASI series. Series E, Applied sciences
Ser. no.:
318
Pub. Year:
1996
Page(from):
305
Page(to):
331
Pages:
27
Pub. info.:
Dordrecht: Kluwer Academic Publishers
ISSN:
0168132X
ISBN:
9780792340119 [0792340116]
Language:
English
Call no.:
N11482/318
Type:
Conference Proceedings

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