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Silicon epitaxy and oxidation

Author(s):
Meindl D. J.
Dutton W. R.
Saraswat C. K.
Plummer D. J.
Kamins I. T.
Deal E. B.
1 more
Publication title:
Process and device modeling for integrated circuit design : [proceedings of the NATO Advanced Study Institute on Process and device modeling for integrated circuit design, Louvain-la-Neuve, Belgium, July 19-29, 1977]
Title of ser.:
NATO ASI series. Series E, Applied sciences
Ser. no.:
21
Pub. date:
1977
Page(from):
57
Page(to):
113
Pages:
57
Pub. info.:
Leyden: Noordhoff International Publishing
ISSN:
0168132X
ISBN:
9789028606678 [902860667X]
Language:
English
Call no.:
N11482/21
Type:
Conference Proceedings

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