Reflection High-Energy Electron Diffraction Intensity Oscillations - An Effective Tool of Si and GexSil-x Molecular Beam Epitaxy

Reflection High-Energy Electron Diffraction Intensity Oscillations - An Effective Tool of Si and GexSil-x Molecular Beam Epitaxy

Author(s):

Sakamoto T.

Publication title:

Thin film growth techniques for low-dimensional structures

Title of ser.:

NATO ASI series. Series B, Physics

Ser. no.:

163

Pub. Year:

1987

Page(from):

225

Page(to):

245

Pages:

21

Pub. info.:

New York: Plenum Press

ISBN:

9780306426865 [0306426862]

Language:

English

Call no.:

N11479/163

Type:

Conference Proceedings

Details

TDL ID:	ZA00017217
Series ID:	PA00000015
Conf. info. (Name):	NATO Advanced Research Workshop on Thin Film Growth Techniques for Low-Dimensional Structures
Conf. info. (Number):	1986
Conf. info. (Venue):	Brighton, UK
Conf. info. (Date):	1986.09.15-1986.09.19

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