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New optical sensor for real-time in-situ endpoint monitoring during dry etching of III-V ternary multistack layers

Author(s):
Liddane,K.J. ( Instruments SA,Inc )
Benferhat,R.
Lee,J.
Westerman,R.
Johnson,D.J.
Donohue,J.F.
Sasserath,J.N.
Pearton,S.J.
3 more
Publication title:
Process, equipment, and materials control in integrated circuit manufacturing V : 22-23 September, 1999, Santa Clara, California
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
3882
Pub. Year:
1999
Page(from):
300
Page(to):
308
Pub. info.:
Bellingham, Wash.: SPIE - The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819434791 [0819434795]
Language:
English
Call no.:
P63600/3882
Type:
Conference Proceedings

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