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Modeling of excimer-laser direct-projection deep etching of photoresist and its application

Author(s):
Publication title:
1999 International Conference on Industrial Lasers
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
3862
Pub. Year:
1999
Page(from):
484
Page(to):
488
Pub. info.:
Bellingham, Wash.: SPIE - The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819434562 [0819434566]
Language:
English
Call no.:
P63600/3862
Type:
Conference Proceedings

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