Anisotropic Etching of AlSiCu in Chlorofluorocarbon Reactive Plasma for the Fabrication of VLSICs

Anisotropic Etching of AlSiCu in Chlorofluorocarbon Reactive Plasma for the Fabrication of VLSICs

Author(s):

Publication title:

Proceedings of the Tenth International Workshop on the Physics of Semiconductor Devices (December 14-18, 1999)

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

3975

Pub. Year:

2000

Vol.:

Part2

Page(from):

875

Page(to):

878

Pub. info.:

Bellingham, Wash.: SPIE - The International Society for Optical Engineering

ISSN:

0277786X

ISBN:

9780819436016 [0819436011]

Language:

English

Call no.:

P63600/3975

Type:

Conference Proceedings

Details

TDL ID:	ZA00017117
Series ID:	PA00000029
Conf. info. (Name):	International Workshop on the Physics of Semiconductor Devices
Conf. info. (Number):	1999 : 10th
Conf. info. (Venue):	Delhi, India
Conf. info. (Date):	1999.12.14-1999.12.18

Similar Items:

1 Conference Proceedings Micromachining of Single Crystal Silicon in Fluorine Based Reactive Plasma for the Fabrication of High Density Nano-Tip Field-Emitter Arrays Pant, B.D., Deshmukh, P.R., Rangra, K.J., Kumar, Satish, Wadhawan, O.P. SPIE-The International Society for Optical Engineering	7 Conference Proceedings Silicon waveguide fabrication process based on the anisotropic etching of Si<111>- oriented wafers Cristea, D., Obreja, P., Manea, E., Kusko, M. SPIE-The International Society for Optical Engineering
2 Conference Proceedings Evolving the Shapes of Large Aspect Ratio Microstructures Through Plasma etching Tandon,U.S., Pant,B.D. Narosa Publishing House	8 Conference Proceedings Plasma Etching for the Application to Low-K Dielectrics Devices J.W. Lee, H.W. Kim, J.W. Han, M.S. Kim, B.D. Yoo, M.H. Kim, C.H. Lee, C.H. Lim, S.K. Hwang, C. Lee, D.J. Chung, S.G. … Trans Tech Publications
3 Conference Proceedings Development of Inverse TLDD Technique at CEERI Andhare,P.N., Pant,B.D., Eranna,G., Virdi,G.S., Soni,R.N., Wadhawan,O.P. SPIE - The International Society for Optical Engineering	9 Conference Proceedings Plasma etching of chromium films in the fabrication of photomasks Coleman,T.P., Buck,P.D. SPIE-The International Society for Optical Engineering
4 Conference Proceedings REACTIVE ION ETCHING OF III-V SEMICONDUCTORS USING HYDROGENATED CHLOROFLUOROCARBON MIXTURES Pearton, S.J., Hobson, W.S., Chakrabarti, U.K., Derkits, G.E., Perley, A.P. Materials Research Society	10 Conference Proceedings Simple wet etching of GaN Parish, G., Scali, P.A., Spaargaren, S.M.R., Nener, B.D. SPIE-The International Society for Optical Engineering
5 Conference Proceedings High-etch-rate anisotropic deep silicon plasma etching for the fabrication of microsensors Pandhumsoporn,T., Feldbaum,M., Gadgil,P., Puech,M., Maquin,P. SPIE-The International Society for Optical Engineering	11 Conference Proceedings Use of deep reactive ion etching in the fabrication of high-efficiency high-resolution crystal x-ray analyzers Shew, B.-Y., Huang, R.-S., Wang, D.-J., Perng, S.-Y., Kuan, C.-K., Cai, Y.Q., Chow, P.C., Schwoerer-Boehning, M., … SPIE-The International Society for Optical Engineering
6 Conference Proceedings High-etch-rate deep anisotropic plasma etching of silicon for MEMS fabrication Pandhumsoporn,T., Wang.L., Feldbaum,M., Gadgil,P., Puech,M., Maquin,P. SPIE-The International Society for Optical Engineering	12 Conference Proceedings Reactive ion etching of GaN in BCl3/N2 plasmas Fedison, J.B., Chow, T.P., Lu, H., Bhat, I.B. Electrochemical Society

1

2

3

4

5

6

7

8

9

10

11

12