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The Use of Electron Channeling Patterns for Process Optimization of Low-Temperature Epitaxial Silicon Using Hot-Wire Chemical Vapor Deposition

Author(s):
Matson, R.
Thiesen, J.
Jones, K. M.
Crandall, R.
Iwaniczko, E.
Mahan, H.
1 more
Publication title:
Epitaxial growth - principles and applications : symposium held April 5-8, 1999, San Francisco, California, U.S.A.
Title of ser.:
Materials Research Society symposium proceedings
Ser. no.:
570
Pub. Year:
1999
Page(from):
135
Pub. info.:
Warrendale, PA: MRS - Materials Research Society
ISSN:
02729172
ISBN:
9781558994775 [1558994777]
Language:
English
Call no.:
M23500/570
Type:
Conference Proceedings

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