Stability and Oxidation Behavior of Ir Thin Film Electrodes on Si and SiO2

Stability and Oxidation Behavior of Ir Thin Film Electrodes on Si and SiO2

Author(s):

Saenger, K. L.

Publication title:

Ferroelectric thin films VII : symposium held November 30-December 3, 1998, Boston, Massachusetts, U.S.A.

Title of ser.:

Materials Research Society symposium proceedings

Ser. no.:

541

Pub. Year:

1999

Page(from):

119

Pub. info.:

Warrendale, PA: MRS - Materials Research Society

ISSN:

02729172

ISBN:

9781558994478 [1558994475]

Language:

English

Call no.:

M23500/541

Type:

Conference Proceedings

Details

TDL ID:	ZA00017065
Series ID:	PA00000011
Conf. info. (Name):	Symposium on ferroelectric thin films
Conf. info. (Number):	7th
Conf. info. (Venue):	Boston, MA, USA
Conf. info. (Date):	1998.11.30-1998.12.03

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