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The Impact of Rapid Thermal Annealing on the Properties of the Si (100)-SiO2 Interface

Author(s):
Hurley, P. K.
Leveugle, C.
Mathewson, A.
Doyle, D.
Whiston, S.
Prendergast, J.
Lundgren, P.
2 more
Publication title:
Defect and impurity engineered semiconductors, II : symposium held April 13-17, 1998, San Francisco, California, U.S.A.
Title of ser.:
Materials Research Society symposium proceedings
Ser. no.:
510
Pub. date:
1998
Page(from):
659
Pub. info.:
Warrendale, Pa: MRS - Materials Research Society
ISSN:
02729172
ISBN:
9781558994164 [1558994165]
Language:
English
Call no.:
M23500/510
Type:
Conference Proceedings

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