Selective Si/SiGe Heterostructures for Advanced CMOS and BiCMOS Technologies
- Author(s):
- Regolini, J. L.
- Publication title:
- Rapid thermal and integrated processing VI : symposium held April 1-4, 1997, San Francisco, California, U.S.A.
- Title of ser.:
- Materials Research Society symposium proceedings
- Ser. no.:
- 470
- Pub. Year:
- 1997
- Page(from):
- 99
- Pub. info.:
- Pittsburgh, PA: MRS - Materials Research Society
- ISSN:
- 02729172
- ISBN:
- 9781558993747 [1558993746]
- Language:
- English
- Call no.:
- M23500/470
- Type:
- Conference Proceedings
Similar Items:
Electrochemical Society |
7
Conference Proceedings
SiGe Selective Epitaxy: Morphology and Thickness Control for High Performance CMOS Technology
Electrochemical Society |
Electrochemical Society |
8
Conference Proceedings
SELECTIVE EPITAXIAL SILICON AND SELECTIVE TITANIUM SILICIDE IN AN INDUSTRIAL INTEGRATED CLUSTER TOOL
MRS - Materials Research Society |
ESA Publications Division |
9
Conference Proceedings
INVITED: A NEW JUNCTION TECHNOLOGY BASED ON SELECTIVE CVD OF SiGe ALLOYS FOR CMOS TECHNOLOGY NODES BEYOND 30 nm
Electrochemical Society |
SPIE - The International Society of Optical Engineering |
10
Conference Proceedings
INVITED: A NEW JUNCTION TECHNOLOGY BASED ON SELECTIVE CVD OF SiGe ALLOYS FOR CMOS TECHNOLOGY NODES BEYOND 30 nm
Electrochemical Society |
Electrochemical Society |
11
Conference Proceedings
DESIGN AND INTEGRATION OF ROBUST BSD PROTECTION IN CMOS/BICMOS TECHNOLOGIES
Electrochemical Society |
MRS - Materials Research Society |
Electrochemical Society |