Rapid Thermal Chemical Vapor Formation of TiSi2: An Alternative Refractory Metallization Process for Device Fabrication

Rapid Thermal Chemical Vapor Formation of TiSi2: An Alternative Refractory Metallization Process for Device Fabrication

Author(s):

Publication title:

Advanced metallization for future ULSI : symposium held April 8-11, 1996, San Francisco, California, U.S.A.

Title of ser.:

Materials Research Society symposium proceedings

Ser. no.:

427

Pub. Year:

1996

Page(from):

523

Pub. info.:

Pittsburgh, Pa.: MRS - Materials Research Society

ISSN:

02729172

ISBN:

9781558993303 [1558993304]

Language:

English

Call no.:

M23500/427

Type:

Conference Proceedings

Details

TDL ID:	ZA00017054
Series ID:	PA00000011
Conf. info. (Name):	Symposium on advanced metallization for future ulsi
Conf. info. (Number):	1996
Conf. info. (Venue):	San Francisco, CA, USA
Conf. info. (Date):	1996.04.08-1996.04.11

Similar Items:

1 Conference Proceedings Silicon Etching in Rapid Thermal Chemical Vapor Deposition of TiSi2 Ren, Xiaowei, Gladden, Dannellia B., Ozturk, Mehmet C., Batchelor, A. Dale MRS - Materials Research Society	7 Conference Proceedings Formation of Raised Source/Drain Junctions by Rapid Thermal Chemical Vapor Deposition Ozturk, Mehmet C., Wortman, Jimmie J. MRS - Materials Research Society
2 Conference Proceedings Selective TiSi2 Formation Using TiCl4(g), Si(s) and H2(g): A Study of the Mask Loading Phenomena Gladden, D. B., Weintraub, G. A., Ozturk, M. C. MRS - Materials Research Society	8 Conference Proceedings Formation of Germanides by Rapid Thermal Annealing and Their Applications in Advanced MOSFET Processes Ashburn P. S., Ozturk C. M. Kluwer Academic Publishers
3 Conference Proceedings Selective Rapid Thermal Chemical Vapor Deposition of Titanium Disilicide on Silicon and Polysilicon Nie, Lixin, Weintraub, Chad E., Ozturk, Mehmet C. MRS - Materials Research Society	9 Conference Proceedings Pre-Deposition Treatments for Selective Rapid Thermal Chemical Vapor Deposition of TiSi2 on Arsenic-Implanted Silicon Substrates Fang, H., Oeztuerk, M.C., O'Neil, P.A., Seebaner, E. Electrochemical Society
4 Conference Proceedings Rapid Thermal Chemical Vapor Deposition of Polycrystalline Silicon-Germanium Films on SiO2 and Their Properties Li, V. Z-Q, Mirabedini, M. R., Kuehn, R. T., Gladden, D., Batchelor, D., Christenson, K., Wortman, J. J., Ozturk, M. C., … MRS - Materials Research Society	10 Conference Proceedings Formation of Ultra-Shallow Junctions in Silicon by Rapid Thermal Vapor Phase Doping in an Ultrahigh Vacuum Rapid Thermal Processing System O'Neil, Patricia A., Violette, Katherine E., Ozturk, Mehmet C., Ivanov, Igor C. MRS - Materials Research Society
5 Conference Proceedings OXIDE REMOVAL ON SILICON BY RAPID THERMAL PROCESSING USING SiH2Cl2 AND H2 Ren, X., Ozturk, M. C., Harris, G., Batchelor, D., Maher, D. M. MRS - Materials Research Society	11 Conference Proceedings Rapid Thrmal Chemical Vapor Deposition of SixGe1-x Alloys in Advanced MOSFET Processes Grider T. D., Ozturk C. M., Ashburn S., Sanganeria M., Wortman J. J. Kluwer Academic Publishers
6 Conference Proceedings *RAPID THERMAL CHEMICAL VAPOR DEPOSITION OF GERMANIUM AND GERMANIUM/SILICON ALLOYS ON SILICON: NEW APPLICATIONS IN THE FABRICATION OF MOS TRANSISTORS Ozturk, M. C., Grider, D. T., Ashburn, S. P., Sanganeria, M., Wortman, J. J. Materials Research Society	12 Conference Proceedings INFLUENCE OF SURFACE PRE-CLEANING ON ELECTRICAL PROPERTIES OF RAPID THERMAL OXIDE AND RAPID THERMAL CHEMICAL VAPOR DEPOSITION OXIDE Xu, Xiaoli, Kuehn, R.T., Melzak, J.M., Hames, G.A., Wortman, J.J., Ozturk, M.C., Nemanich, R.J., Harris, G., Maher, D. Materials Research Society

1

2

3

4

5

6

7

8

9

10

11

12