Blank Cover Image

0.1ｦﾌm Technology and BEOL

Author(s):
Ning, Tak H.  
Publication title:
Advanced metallization for future ULSI : symposium held April 8-11, 1996, San Francisco, California, U.S.A.
Title of ser.:
Materials Research Society symposium proceedings
Ser. no.:
427
Pub. Year:
1996
Page(from):
17
Pub. info.:
Pittsburgh, Pa.: MRS - Materials Research Society
ISSN:
02729172
ISBN:
9781558993303 [1558993304]
Language:
English
Call no.:
M23500/427
Type:
Conference Proceedings

Similar Items:

1 Conference Proceedings Feasibility of printing 0.1-ｦﾌm technology with optical lithography

Maenhoudt,M., Verhaegen,S., Ronse,K., Flagello,D.G., Geh,B., Kaiser,W.M.

SPIE - The International Society for Optical Engineering
7 Conference Proceedings Self-heating as a tool for measuring sub-0.1-ｦﾌm silicon-on-insulator device parameters

Osman,M.A., Osman,A.A.

SPIE-The International Society for Optical Engineering
2 Conference Proceedings Evaluation of 2.0nm Grown and Deposited Dielectrics in 0.1ｦﾌm PMOSFETs

Srivastava, A., Heinisch, H. H., Vogel, E., Parker, C., Osburn, C. M., Masnari, N. A., Wortman, J. J., Hauser, J. R.

MRS - Materials Research Society
8 Conference Proceedings Mix-and-match lithography processes for 0.1-ｦﾌm MOS transistor device fabrication

Yew,J.-Y., Chen,L.-J., Nakamura,K., Chao,T.-S., Lin,H.-C.

SPIE-The International Society for Optical Engineering
3 Conference Proceedings 0.1ｦﾌm Interconnect Technology Challenges and the SIA Road Map

Seidel, Tom, Zhao, Bin

MRS - Materials Research Society
9 Conference Proceedings Measuring the effects of sub-0.1-ｦﾌm filtration on 248-nm photoresist performance

Gotlinsky,B., Beach,J.V., Mesawich,M.

SPIE - The International Society for Optical Engineering
4 Conference Proceedings Impact of the Coulomb interaction effect on delineating densely repeated 0.1-ｦﾌm patterns using electron-beam block exposure

Takahashi,K., Yamazaki,S., Ohno,M., Watanabe,H., Sakakibara,T., Satoh,M., Nagata,T., Yamada,A., Yasuda,H., Nara,Y., …

SPIE-The International Society for Optical Engineering
10 Conference Proceedings Dimension-temperature combination scaling for low-temperature 0.1-ｦﾌm CMOS

Masu,K., Yokoyama,M., Tsubouchi,K.

SPIE-The International Society for Optical Engineering
5 Conference Proceedings Recording of 0.1-ｦﾌm minimum mark size in a new phase-change media

Miura,H., Hayashi,Y., Fujita,S., Ujiie,K., Yokomori,K.

SPIE - The International Society for Optical Engineering
11 Conference Proceedings Ellipsometric scatterometry for sub-0.1-ｦﾌm CD measurements

Coulombe,S.A., Logofatu,P.C., Minhas,B.K., Naqvi,S.S.H., McNeil,J.R.

SPIE-The International Society for Optical Engineering
6 Conference Proceedings Response-surface-based optimization of 0.1-ｦﾌm PMOSFETs with ultrathin gate stack dielectrics

Srivastava,A., Osburn,C.M.

SPIE-The International Society for Optical Engineering
12 Conference Proceedings Toward sub-0.1-ｦﾌm CD measurements using scatterometry

Minhas,B.K., Prins,S.L., Naqvi,S.S.H., McNeil,J.R.

SPIE-The International Society for Optical Engineering
1
 
2
 
3
 
4
 
5
 
6
 
7
 
8
 
9
 
10
 
11
 
12