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Process optimization of single-coat positive photoresist for thick film applications

Author(s):
Kozlowski,A.E. ( Shipley Co.,Inc. )  
Publication title:
Microlithography and Metrology in Micromachining
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
2640
Pub. Year:
1995
Page(from):
121
Page(to):
131
Pub. info.:
Bellingham, Wash.: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819420060 [0819420069]
Language:
English
Call no.:
P63600/2640
Type:
Conference Proceedings

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