Surface treatment effects on Si(111) and (100) surface structures and Si/SiO2 interface state

Surface treatment effects on Si(111) and (100) surface structures and Si/SiO2 interface state

Author(s):

Yamamoto,H. ( Osaka Univ.(Japan) )
Okumura,K. ( Osaka Univ.(Japan) )
Kanashima,T. ( Osaka Univ.(Japan) )
Okuyama,M. ( Osaka Univ.(Japan) )

Publication title:

Third International Conference on Thin Film Physics and Applications : 15-17 April 1997, Shanghai, China

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

3175

Pub. Year:

1998

Page(from):

161

Page(to):

165

Pub. info.:

Bellingham, Wash.: SPIE-The International Society for Optical Engineering

ISSN:

0277786X

ISBN:

9780819426734 [0819426733]

Language:

English

Call no.:

P63600/3175

Type:

Conference Proceedings

Details

TDL ID:	ZA00016935
Series ID:	PA00000029
Conf. info. (Name):	International Conference on Thin Film Physics and Applications
Conf. info. (Number):	1997 : 3rd
Conf. info. (Venue):	Shanghai, China
Conf. info. (Date):	1997.04.15-1997.04.17

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