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Profile characteristics and simulation of chemically amplified resists in electron-beam lithography

Author(s):
  • Ham,Y.-M. ( Seoul National Univ.(Korea) and Hyundai Electronics Industries Co. Ltd. (Korea) )
  • Lee,C. ( Seoul National Univ.(Korea) )
  • Kim,S.-H. ( Seoul National Univ.(Korea) )
  • Chun,K. ( Seoul National Univ.(Korea) )
Publication title:
Microlithographic Techniques in IC Fabrication
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
3183
Pub. Year:
1997
Page(from):
154
Page(to):
160
Pub. info.:
Bellingham, Wash.: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819426109 [0819426105]
Language:
English
Call no.:
P63600/3183
Type:
Conference Proceedings

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