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Comparison of different optical proximity correction models with three-dimensional photolithography simulation over planar substrates (Invited Paper)

Author(s):
  • Rey,J.C. ( Technology Modeling Associates,Inc. )
  • Li,J. ( Technology Modeling Associates,Inc. )
  • Boksha,V.V. ( Technology Modeling Associates,Inc. )
  • Bernard,D.A. ( Technology Modeling Associates,Inc. )
Publication title:
Microlithographic Techniques in IC Fabrication
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
3183
Pub. Year:
1997
Page(from):
68
Page(to):
81
Pub. info.:
Bellingham, Wash.: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819426109 [0819426105]
Language:
English
Call no.:
P63600/3183
Type:
Conference Proceedings

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