Cl2 Plasma-Si Surface Interactins in Plasma Etching

Cl2 Plasma-Si Surface Interactins in Plasma Etching

Author(s):

Donnelly M. V.

Publication title:

Plasma processing of semiconductors

Title of ser.:

NATO ASI series. Series E, Applied sciences

Ser. no.:

336

Pub. Year:

1997

Page(from):

243

Page(to):

275

Pages:

33

Pub. info.:

Dordrecht: kluwer Academic Publishers

ISSN:

0168132X

ISBN:

9780792345671 [0792345673]

Language:

English

Call no.:

N11482/336

Type:

Conference Proceedings

Details

TDL ID:	ZA00016902
Series ID:	PA00000018
Conf. info. (Name):	NATO Advanced Study Institute on Plasma Processing of Semiconductors
Conf. info. (Number):	1996
Conf. info. (Venue):	Chateau de Bonas, France
Conf. info. (Date):	1996.06.17-1996.06.18

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