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Surface Science Aspects of Etching and Wall Reactions in High Density Plasmas

Author(s):
Coburn W. J.  
Publication title:
Plasma processing of semiconductors
Title of ser.:
NATO ASI series. Series E, Applied sciences
Ser. no.:
336
Pub. Year:
1997
Page(from):
211
Page(to):
219
Pages:
9
Pub. info.:
Dordrecht: kluwer Academic Publishers
ISSN:
0168132X
ISBN:
9780792345671 [0792345673]
Language:
English
Call no.:
N11482/336
Type:
Conference Proceedings

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