Si-Ge STRAINED LAYER HETEROSTRUCTURES: DEVICE POSSIBILITIES AND PROCESS LIMITATIONS

Si-Ge STRAINED LAYER HETEROSTRUCTURES: DEVICE POSSIBILITIES AND PROCESS LIMITATIONS

Author(s):

Publication title:

Multicomponent and multilayered thin films for advanced microtechnologies : techniques, fundamentals, and devices

Title of ser.:

NATO ASI series. Series E, Applied sciences

Ser. no.:

234

Pub. Year:

1993

Page(from):

401

Page(to):

444

Pages:

44

Pub. info.:

Dordrecht: Kluwer Academic Publishers

ISSN:

0168132X

ISBN:

9780792322658 [0792322657]

Language:

English

Call no.:

N11482/234

Type:

Conference Proceedings

Details

TDL ID:	ZA00016848
Series ID:	PA00000018
Conf. info. (Name):	NATO Advanced Study Institute on Multicomponent and Multilayered Thin Films for Advanced Microtechnologies
Conf. info. (Number):	1992
Conf. info. (Venue):	Bad indsheim, Germany
Conf. info. (Date):	1992.09.21-1992.10.02

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