New methodology for measuring highly aberrated wavefronts induced by diffractive optical elements

New methodology for measuring highly aberrated wavefronts induced by diffractive optical elements

Author(s):

Chen,Y.C. ( National Taiwan Univ. )
Lee,S.S.
Lee,C.M.
Lee,C.K.
Yeh,G.B.

Publication title:

Testing, packaging, reliability, and applications of semiconductor lasers IV : 28 January 1999, San Jose, California

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

3626

Pub. Year:

1999

Page(from):

248

Page(to):

259

Pub. info.:

Bellingham, Wash.: SPIE - The International Society for Optical Engineering

ISSN:

0277786X

ISBN:

9780819430960 [081943096X]

Language:

English

Call no.:

P63600/3626

Type:

Conference Proceedings

Details

TDL ID:	ZA00016671
Series ID:	PA00000029
Conf. info. (Name):	Photonics West : Testing, Packaging, Reliability, and Applications of Semiconductor Lasers
Conf. info. (Number):	1999 : 4th
Conf. info. (Venue):	San Jose, CA, USA
Conf. info. (Date):	1999.01.28

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