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Real-Time Spectroscopic Ellipsometry Study of the Thermal Cleaning Process for Silicon Epitaxial Growth by UHV-CVD

Author(s):
Nozawa, K.
Katayama, K.
Kanzawa, Y.
Sugahara, G.
Saitoh, T.
Kubo, M.
1 more
Publication title:
In situ process diagnostics and modelling : symposium held April 6-7, 1999, San Francisco, California, U.S.A.
Title of ser.:
Materials Research Society symposium proceedings
Ser. no.:
569
Pub. date:
1999
Page(from):
83
Pub. info.:
Warrendale, PA: MRS - Materials Research Society
ISSN:
02729172
ISBN:
9781558994768 [1558994769]
Language:
English
Call no.:
M23500/569
Type:
Conference Proceedings

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