Monte Carlo Simulation of Boron Diffusion During Low Energy Implantation and High-Temperature Annealing

Author(s):

• Caturla, M-J.
• Rubia, T. Diaz de la
• Zhu, J.
• Johnson, M.

Publication title:

Defects and diffusion in silicon processing : symposium held April 1-4, 1997, San Francisco, California, U.S.A.

Title of ser.:

Materials Research Society symposium proceedings

Ser. no.:

469

Pub. Year:

1997

Page(from):

335

Pub. info.:

Pittsburg, Pa.: MRS - Materials Research Society

ISSN:

02729172

ISBN:

9781558993730 [1558993738]

Language:

English

Call no.:

M23500/469

Type:

Conference Proceedings