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Low-Energy Implantation and Transient-Enhanced Diffusion: Physical Mechanisms and Technology Implications

Author(s):
Cowern, N. E. B.
Collart, E. J. H.
Politiek, J.
Bancken, P. H. L.
Berkum, J. G. M. van
Larsen, K. Kyllesbech
Stolk, P. A.
Huizing, H. G. A.
Pichler, P.
Burenkov, A.
Gravesteijn, D. J.
6 more
Publication title:
Defects and diffusion in silicon processing : symposium held April 1-4, 1997, San Francisco, California, U.S.A.
Title of ser.:
Materials Research Society symposium proceedings
Ser. no.:
469
Pub. date:
1997
Page(from):
265
Pub. info.:
Pittsburg, Pa.: MRS - Materials Research Society
ISSN:
02729172
ISBN:
9781558993730 [1558993738]
Language:
English
Call no.:
M23500/469
Type:
Conference Proceedings

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