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Controlled Incorporation of Nitrogen at the Top Surface of Silicon Oxide Gate Dielectrics

Author(s):
Publication title:
Amorphous and crystalline insulating thin films--1996 : symposium held December 2-4, 1996, Boston, Massachusetts, U.S.A.
Title of ser.:
Materials Research Society symposium proceedings
Ser. no.:
446
Pub. Year:
1997
Page(from):
103
Pub. info.:
Pittsburgh, Pa.: MRS - Materials Research Society
ISSN:
02729172
ISBN:
9781558993501 [1558993509]
Language:
English
Call no.:
M23500/446
Type:
Conference Proceedings

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