Fabrication of Novel III-N and III-V Modulator Structures by ECR Plasma Etching

Fabrication of Novel III-N and III-V Modulator Structures by ECR Plasma Etching

Author(s):

Pearton, S. J.

Hagerott-Crawford, M.

Publication title:

Surface/interface and stress effects in electronic material nanostructures : symposium held November 27-December 1, 1995, Boston, Massachusetts, U.S.A.

Title of ser.:

Materials Research Society symposium proceedings

Ser. no.:

405

Pub. Year:

1996

Page(from):

115

Pub. info.:

Pittsburgh, Pa.: MRS - Materials Research Society

ISSN:

02729172

ISBN:

9781558993082 [1558993088]

Language:

English

Call no.:

M23500/405

Type:

Conference Proceedings

Details

TDL ID:	ZA00016580
Series ID:	PA00000011
Conf. info. (Name):	Symposium on surface/interface and stress effects in electronic material nanostructures
Conf. info. (Number):	1995
Conf. info. (Venue):	Boston, MA, USA
Conf. info. (Date):	1995.11.27-1995.12.01

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