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Origin and Incorporation Mechanism for Oxygen Contaminants in a-Si:H and ｦﾌc-Si:H Films Prepared by the Very High Frequency (70 MHz) Glow Discharge Technique

Author(s):
Kroll, U.
Meier, J.
Keppner, H.
Littlewood, S. D.
Kelly, I. E.
Giannoules, P.
Shah, A.
2 more
Publication title:
Amorphous silicon technology, 1995 : Symposium held April 18-21, 1995, San Francisco, California, U.S.A.
Title of ser.:
Materials Research Society symposium proceedings
Ser. no.:
377
Pub. Year:
1995
Page(from):
39
Pub. info.:
Pittsburgh, Pa.: MRS - Materials Research Society
ISSN:
02729172
ISBN:
9781558992801 [1558992804]
Language:
English
Call no.:
M23500/377
Type:
Conference Proceedings

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