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Performance of excimer lasers as light sources for 193-nm lithography

Author(s):
Sedlacek,J.H.C. ( MIT Lincoln Lab. )
Doran,S.P.
Fritze,M.
Kunz,R.R.
Rothschild,M.
Uttaro,R.S.
Corliss,D.A.
2 more
Publication title:
Optical Microlithography X
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
3051
Pub. Year:
1997
Page(from):
874
Page(to):
881
Pub. info.:
Bellingham, Wash.: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819424655 [081942465X]
Language:
English
Call no.:
P63600/3051
Type:
Conference Proceedings

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