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Optical proximity correction of alternating phase-shift masks for 0.18-ヲフm KrF lithography

Author(s):
Publication title:
Optical Microlithography X
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
3051
Pub. date:
1997
Page(from):
751
Page(to):
762
Pub. info.:
Bellingham, Wash.: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819424655 [081942465X]
Language:
English
Call no.:
P63600/3051
Type:
Conference Proceedings

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