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Optical proximity effects correction at 0.25ヲフm incorporating process variations in lithography

Author(s):
Tritchkov,A. ( Interuniv.Micro-Elektronica Centrum vzw )
Rieger,M.L.
Stirniman,J.P.
Yen,A.
Ronse,K.
Vandenberghe,G.
hove,L.Van den
2 more
Publication title:
Optical Microlithography X
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
3051
Pub. date:
1997
Page(from):
726
Page(to):
738
Pub. info.:
Bellingham, Wash.: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819424655 [081942465X]
Language:
English
Call no.:
P63600/3051
Type:
Conference Proceedings

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