Photolithographic lens characterization of critical dimension variation using empirical focal-plane modeling
- Author(s):
- Dusa,M.V. ( National Semiconductor Corp. )
- Su,B.
- Dellarochetta,S.
- Zavecz,T.E.
- Publication title:
- Optical Microlithography X
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 3051
- Pub. Year:
- 1997
- Page(from):
- 697
- Page(to):
- 707
- Pub. info.:
- Bellingham, Wash.: SPIE-The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819424655 [081942465X]
- Language:
- English
- Call no.:
- P63600/3051
- Type:
- Conference Proceedings
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