Model-based optical proximity correction including effects of photoresist processes

Model-based optical proximity correction including effects of photoresist processes

Author(s):

Li,J. ( Technology Modeling Associates,Inc. )
Bernard,D.A.
Rey,J.C.
Boksha,V.V.

Publication title:

Optical Microlithography X

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

3051

Pub. Year:

1997

Page(from):

643

Page(to):

651

Pub. info.:

Bellingham, Wash.: SPIE-The International Society for Optical Engineering

ISSN:

0277786X

ISBN:

9780819424655 [081942465X]

Language:

English

Call no.:

P63600/3051

Type:

Conference Proceedings

Details

TDL ID:	ZA00016573
Series ID:	PA00000029
Conf. info. (Name):	SPIE Advanced Lithography : Optical Microlithography
Conf. info. (Number):	1997 : 10th
Conf. info. (Venue):	Santa Clara, CA, USA
Conf. info. (Date):	1997.03.12-1997.03.14

Similar Items:

1 Conference Proceedings Comparison of different optical proximity correction models with three-dimensional photolithography simulation over planar substrates (Invited Paper) Rey,J.C., Li,J., Boksha,V.V., Bernard,D.A. SPIE-The International Society for Optical Engineering	7 Conference Proceedings Advanced model formulations for optical and process proximity correction Beale, D.F., Shiely, J.P., Melvin, L.L., III, Rieger, M.L. SPIE - The International Society of Optical Engineering
2 Conference Proceedings Optimal proximity correction: application for flash memory design Chen,Y.G., Huang,D.L., Sung,K.T., Chiang,J.J., Yu,M., Teng,F., Chu,L., Rey,J.C., Bernard,D.A., Li,J., Moroz,V., … SPIE-The International Society for Optical Engineering	8 Conference Proceedings Improving model-based optical proximity correction accuracy using improved process data gen~ration [6149-30] Lu, M., King, D., Liang, C., Melvin, L. S. III SPIE - The International Society of Optical Engineering
3 Conference Proceedings Advanced simulation techniques for thick photoresist lithography Flack,W.W., Newman,G., Bernard,D.A., Rey,J.C., Granik,Y., Boksha,V.V. SPIE-The International Society for Optical Engineering	9 Conference Proceedings New approach to optical proximity correction Rosenbusch,A., Juffermans,A.H., Kirsch,H., Lalanne,F.P., Maurer,W., Romeo,C., Ronse,K., Schiavone,P., Simecek,M., … SPIE - The International Society for Optical Engineering
4 Conference Proceedings Sub-half-micron contact window design with 3D photolithography simulator Brainerd,S.K., Bernard,D.A., Rey,J.C., Li,J., Granik,Y., Boksha,V.V. SPIE-The International Society for Optical Engineering	10 Conference Proceedings Efficient computational techniques for aerial imaging simulation Bernard,D.A., Li,J., Rey,J.C., Rouz,K., Axelrad,V. SPIE-The International Society for Optical Engineering
5 Conference Proceedings Process dependencies of optical proximity corrections Zach,F.X., Samuels,D.J., Thomas,A.C., Butt,S.A. SPIE-The International Society for Optical Engineering	11 Conference Proceedings Adjustment of optical proximity correction (OPC) software for mask process correction (MPC): Module 2. Lithography simulation based on optical mask writing tool … Barberet, A., Buck, P.D., Fanget, G.L., Toublan, O., Richoilley, J.-C., Tissier, M. SPIE-The International Society for Optical Engineering
6 Conference Proceedings Characterization of optical proximity correction features Allgair,J.A., Ivy,M., Lucas,K., Sturtevant,J.L., Elliott,R.C., Mack,C.A., MacNaughton,C.W., Miller,J.D., Pochkowski,M., … SPIE-The International Society for Optical Engineering	12 Conference Proceedings Process, design, and optical proximity correction requirements for the 65-nm device generation Lucas, K., Montgomery, P., Litt, L.C., Conley, W., Postnikov, S.V., Wu, W., Yuan, C.-M., Olivares, M., Strozewski, K., … SPIE-The International Society for Optical Engineering

1

2

3

4

5

6

7

8

9

10

11

12