Fast modeling of 3D planar resist images for high-NA projection lithography
- Author(s):
Ivin,V.V. ( SOFT-TEC ) Larin,D.Yu. Lucas,K.D. Makhviladze,T.M. Rogov,A.A. Verzunov,S.V. - Publication title:
- Optical Microlithography X
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 3051
- Pub. Year:
- 1997
- Page(from):
- 567
- Page(to):
- 577
- Pub. info.:
- Bellingham, Wash.: SPIE-The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819424655 [081942465X]
- Language:
- English
- Call no.:
- P63600/3051
- Type:
- Conference Proceedings
Similar Items:
1
Conference Proceedings
Method of easily extracting resist development parameters for lithography simulation
SPIE-The International Society for Optical Engineering |
Society of Photo-optical Instrumentation Engineers |
2
Conference Proceedings
Extension of the traditional optical model for investigation into EUV projection lithography capabilities
SPIE-The International Society for Optical Engineering |
8
Conference Proceedings
Re-evaluating simple lambda-based design rules for low-K1 lithography process control
SPIE - The International Society for Optical Engineering |
3
Conference Proceedings
Monte Carlo method for highly efficient and accurate statistical lithography simulations
SPIE-The International Society for Optical Engineering |
9
Conference Proceedings
Speckle intensity correlation analysis as a nethod of tissue structure imaging
SPIE-The International Society for Optical Engineering |
4
Conference Proceedings
Advanced model for resist heating effect simulation in electron-beam lithography
SPIE-The International Society for Optical Engineering |
SPIE - The International Society of Optical Engineering |
5
Conference Proceedings
Analytical simulation of statistically inhomogenous intensity fluctuations of biospeckles using band-limited fractal model
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
ESA Publications Division |
12
Conference Proceedings
Speckle pattern polarization analysis as an approach to turbid tissue structure monitoring
SPIE-The International Society for Optical Engineering |