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Control and uniformity of 280-nm features in i-line lithography using optical proximity corrections and off-axis illumination

Author(s):
Watson,G.P. ( Lucent Technologies Bell Labs. )
Garofalo,J.G.
Hansen,M.
Grodnensky,I.M.
Zych,L.J.
Takahashi,R.
Yarbrough,W.J.
Ehrlacher,E.
Reim,A.
Vella,R.M.
Dunbar,A.
Colina,A.
Herrero,B.
Castro,D.
9 more
Publication title:
Optical Microlithography X
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
3051
Pub. Year:
1997
Page(from):
374
Page(to):
383
Pub. info.:
Bellingham, Wash.: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819424655 [081942465X]
Language:
English
Call no.:
P63600/3051
Type:
Conference Proceedings

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