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NA/o optimization strategies for an advanced DUV stepper applied to 0.25-ヲフm and sub-0.25-ヲフm critical levels

Author(s):
Beeck,M.Op de ( Interuniv.Micro-Elektronica Centrum vzw )
Ronse,K.
Ghandehari,K.
Jaenen,P.
Botermans,H.
Finders,J.
Lilygren,J.A.
Baker,D.C.
Vandenberghe,G.
Bisschop,P.De
Maenhoudt,M.
hove,L.Van den
7 more
Publication title:
Optical Microlithography X
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
3051
Pub. date:
1997
Page(from):
320
Page(to):
332
Pub. info.:
Bellingham, Wash.: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819424655 [081942465X]
Language:
English
Call no.:
P63600/3051
Type:
Conference Proceedings

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